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Holographic Design and Fabrication of Diamond Symmetry Photonic Crystals Via Dual-Beam Quadruple Exposure

Authors

  • Guanquan Liang,

    1. Department of Materials Science and Engineering, University of Pennsylvania, 3231 Walnut Street, Philadelphia, PA 19104 (USA)
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  • Xuelian Zhu,

    1. Department of Materials Science and Engineering, University of Pennsylvania, 3231 Walnut Street, Philadelphia, PA 19104 (USA)
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  • Yongan Xu,

    1. Department of Materials Science and Engineering, University of Pennsylvania, 3231 Walnut Street, Philadelphia, PA 19104 (USA)
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  • Jie Li,

    1. Department of Materials Science and Engineering, University of Pennsylvania, 3231 Walnut Street, Philadelphia, PA 19104 (USA)
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  • Shu Yang

    Corresponding author
    1. Department of Materials Science and Engineering, University of Pennsylvania, 3231 Walnut Street, Philadelphia, PA 19104 (USA)
    • Department of Materials Science and Engineering, University of Pennsylvania, 3231 Walnut Street, Philadelphia, PA 19104 (USA).
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Abstract

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Diamond symmetry structures (space group No. 227) with tunable lattice size are fabricated from epoxy-functionalized cyclohexyl polyhedral oligomeric silsesquioxane (POSS) by holographic lithography using dual-beam quadruple exposure configuration with careful consideration of the relative phase shift, wobble effect, and pre-compensation of the photoresist shrinkage. Calculation suggests that Si photonic crystals templated from the POSS structures, both directly converted and its inverse structure, offer the same and maximum complete PBGs in comparison to other holographically patterned diamond lattices. Holographic Design and Fabrication of Diamond Symmetry Photonic Crystals Via Dual-Beam Quadruple Exposure

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