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Keywords:

  • planar patch-clamp;
  • gigaohm seals;
  • metal masks;
  • reactive ion etching;
  • high aspect ratio pore
Thumbnail image of graphical abstract

The success of the patch-clamp technique has driven an effort to create wafer-based patch-clamp platforms. We develop a lithographic/electrochemical processing scheme that generates ultrasmooth, high aspect ratio pores in quartz. These devices achieve gigaohm seals in nearly 80% of trials, with the majority exhibiting seal resistances from 20-80 GΩ, competing with pipette-based patch-clamp measurements.