Communication
Batch Fabrication of High-Performance Planar Patch-Clamp Devices in Quartz
Article first published online: 9 SEP 2010
DOI: 10.1002/adma.201001793
Copyright © 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Additional Information
How to Cite
Nagarah, J. M., Paek, E., Luo, Y., Wang, P., Hwang, G. S. and Heath, J. R. (2010), Batch Fabrication of High-Performance Planar Patch-Clamp Devices in Quartz. Adv. Mater., 22: 4622–4627. doi: 10.1002/adma.201001793
Publication History
- Issue published online: 22 OCT 2010
- Article first published online: 9 SEP 2010
- Manuscript Received: 14 MAY 2010
Keywords:
- planar patch-clamp;
- gigaohm seals;
- metal masks;
- reactive ion etching;
- high aspect ratio pore

The success of the patch-clamp technique has driven an effort to create wafer-based patch-clamp platforms. We develop a lithographic/electrochemical processing scheme that generates ultrasmooth, high aspect ratio pores in quartz. These devices achieve gigaohm seals in nearly 80% of trials, with the majority exhibiting seal resistances from 20-80 GΩ, competing with pipette-based patch-clamp measurements.

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