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Keywords:

  • nanofabrication;
  • reflection suppression;
  • self-cleaning surfaces;
  • plasma etching
Thumbnail image of graphical abstract

Maskless plasma etching forms nanospikes on a silicon wafer. The inverse of the nanospike pattern is replicated into a poly(dimethylsiloxane) (PDMS) film by casting. The PDMS functions as a stamp for replicating the original pattern into polymeric substrates. All nanospike-structured surfaces suppress light reflection and can be made self-cleaning.