Communication

Non-Reflecting Silicon and Polymer Surfaces by Plasma Etching and Replication

  1. Lauri Sainiemi1,*,
  2. Ville Jokinen2,
  3. Ali Shah3,
  4. Maksim Shpak4,
  5. Susanna Aura3,
  6. Pia Suvanto1,
  7. Sami Franssila1

Article first published online: 27 OCT 2010

DOI: 10.1002/adma.201001810

Issue

Advanced Materials

Advanced Materials

Volume 23, Issue 1, pages 122–126, January 4, 2011

Additional Information

How to Cite

Sainiemi, L., Jokinen, V., Shah, A., Shpak, M., Aura, S., Suvanto, P. and Franssila, S. (2011), Non-Reflecting Silicon and Polymer Surfaces by Plasma Etching and Replication. Adv. Mater., 23: 122–126. doi: 10.1002/adma.201001810

Author Information

  1. 1

    Department of Materials Science and Engineering, Aalto University School of Science and Technology, P.O. Box 16200, FIN-00076 Aalto, Finland

  2. 2

    Protein Chemistry Unit, Institute of Biomedicine, University of Helsinki, FIN-00014 Helsinki, Finland

  3. 3

    Department of Micro and Nanoscience, Aalto University School of Science and Technology, P.O. Box 13500, FIN-00076 Aalto, Finland

  4. 4

    Metrology Research Institute, Aalto University School of Science and Technology, P.O. Box 13500, FIN-00076 Aalto, Finland

*Department of Materials Science and Engineering, Aalto University School of Science and Technology, P.O. Box 16200, FIN-00076 Aalto, Finland.

Publication History

  1. Issue published online: 27 DEC 2010
  2. Article first published online: 27 OCT 2010
  3. Manuscript Revised: 11 AUG 2010
  4. Manuscript Received: 17 MAY 2010

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Keywords:

  • nanofabrication;
  • reflection suppression;
  • self-cleaning surfaces;
  • plasma etching
Thumbnail image of graphical abstract

Maskless plasma etching forms nanospikes on a silicon wafer. The inverse of the nanospike pattern is replicated into a poly(dimethylsiloxane) (PDMS) film by casting. The PDMS functions as a stamp for replicating the original pattern into polymeric substrates. All nanospike-structured surfaces suppress light reflection and can be made self-cleaning.

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