Advanced Materials

Non-Reflecting Silicon and Polymer Surfaces by Plasma Etching and Replication

Authors

  • Lauri Sainiemi,

    Corresponding author
    1. Department of Materials Science and Engineering, Aalto University School of Science and Technology, P.O. Box 16200, FIN-00076 Aalto, Finland
    • Department of Materials Science and Engineering, Aalto University School of Science and Technology, P.O. Box 16200, FIN-00076 Aalto, Finland.
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  • Ville Jokinen,

    1. Protein Chemistry Unit, Institute of Biomedicine, University of Helsinki, FIN-00014 Helsinki, Finland
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  • Ali Shah,

    1. Department of Micro and Nanoscience, Aalto University School of Science and Technology, P.O. Box 13500, FIN-00076 Aalto, Finland
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  • Maksim Shpak,

    1. Metrology Research Institute, Aalto University School of Science and Technology, P.O. Box 13500, FIN-00076 Aalto, Finland
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  • Susanna Aura,

    1. Department of Micro and Nanoscience, Aalto University School of Science and Technology, P.O. Box 13500, FIN-00076 Aalto, Finland
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  • Pia Suvanto,

    1. Department of Materials Science and Engineering, Aalto University School of Science and Technology, P.O. Box 16200, FIN-00076 Aalto, Finland
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  • Sami Franssila

    1. Department of Materials Science and Engineering, Aalto University School of Science and Technology, P.O. Box 16200, FIN-00076 Aalto, Finland
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Abstract

Maskless plasma etching forms nanospikes on a silicon wafer. The inverse of the nanospike pattern is replicated into a poly(dimethylsiloxane) (PDMS) film by casting. The PDMS functions as a stamp for replicating the original pattern into polymeric substrates. All nanospike-structured surfaces suppress light reflection and can be made self-cleaning.

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