Advanced Materials

Nanostructures and Functional Materials Fabricated by Interferometric Lithography

Authors

  • Deying Xia,

    1. Department of Materials Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA 02139, USA
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  • Zahyun Ku,

    1. Center for High Technology Materials and Department of Electrical and Computer Engineering, University of New Mexico, Albuquerque, NM 87106, USA
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  • S. C. Lee,

    1. Center for High Technology Materials, University of New Mexico, Albuquerque, NM 87106, USA
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  • S. R. J. Brueck

    Corresponding author
    1. Center for High Technology Materials and Department of Electrical and Computer Engineering, University of New Mexico, Albuquerque, NM 87106, USA
    • Center for High Technology Materials and Department of Electrical and Computer Engineering, University of New Mexico, Albuquerque, NM 87106, USA.
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Abstract

Interferometric lithography (IL) is a powerful technique for the definition of large-area, nanometer-scale, periodically patterned structures. Patterns are recorded in a light-sensitive medium, such as a photoresist, that responds nonlinearly to the intensity distribution associated with the interference of two or more coherent beams of light. The photoresist patterns produced with IL are a platform for further fabrication of nanostructures and growth of functional materials and are building blocks for devices. This article provides a brief review of IL technologies and focuses on various applications for nanostructures and functional materials based on IL including directed self-assembly of colloidal nanoparticles, nanophotonics, semiconductor materials growth, and nanofluidic devices. Perspectives on future directions for IL and emerging applications in other fields are presented.

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