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Advanced Materials

Fabrication of n- and p-Type Organic Thin Film Transistors with Minimized Gate Overlaps by Self-Aligned Nanoimprinting

Authors

  • Ursula Palfinger,

    1. Institute of Nanostructured Materials and Photonics, Joanneum Research GmbH, Franz-Pichlerstrasse 30, A-8160 Weiz (Austria), Fax: 0043-316-876-2710, Telephone: 0043-316-876-2721
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  • Christoph Auner,

    1. Institute of Nanostructured Materials and Photonics, Joanneum Research GmbH, Franz-Pichlerstrasse 30, A-8160 Weiz (Austria), Fax: 0043-316-876-2710, Telephone: 0043-316-876-2721
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  • Herbert Gold,

    1. Institute of Nanostructured Materials and Photonics, Joanneum Research GmbH, Franz-Pichlerstrasse 30, A-8160 Weiz (Austria), Fax: 0043-316-876-2710, Telephone: 0043-316-876-2721
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  • Anja Haase,

    1. Institute of Nanostructured Materials and Photonics, Joanneum Research GmbH, Franz-Pichlerstrasse 30, A-8160 Weiz (Austria), Fax: 0043-316-876-2710, Telephone: 0043-316-876-2721
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  • Johanna Kraxner,

    1. Institute of Nanostructured Materials and Photonics, Joanneum Research GmbH, Franz-Pichlerstrasse 30, A-8160 Weiz (Austria), Fax: 0043-316-876-2710, Telephone: 0043-316-876-2721
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  • Thomas Haber,

    1. Institute for Electron Microscopy, Graz University of Technology, Steyrergasse 17, A-8010 Graz (Austria)
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  • Meltem Sezen,

    1. Institute for Electron Microscopy, Graz University of Technology, Steyrergasse 17, A-8010 Graz (Austria)
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  • Werner Grogger,

    1. Institute for Electron Microscopy, Graz University of Technology, Steyrergasse 17, A-8010 Graz (Austria)
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  • Gerhard Domann,

    1. Fraunhofer-Institut für Silicatforschung ISC, Neunerplatz 2, D-97082 Würzburg (Germany)
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  • Georg Jakopic,

    1. Institute of Nanostructured Materials and Photonics, Joanneum Research GmbH, Franz-Pichlerstrasse 30, A-8160 Weiz (Austria), Fax: 0043-316-876-2710, Telephone: 0043-316-876-2721
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  • Joachim R. Krenn,

    1. Institute of Nanostructured Materials and Photonics, Joanneum Research GmbH, Franz-Pichlerstrasse 30, A-8160 Weiz (Austria), Fax: 0043-316-876-2710, Telephone: 0043-316-876-2721
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  • Barbara Stadlober

    Corresponding author
    1. Institute of Nanostructured Materials and Photonics, Joanneum Research GmbH, Franz-Pichlerstrasse 30, A-8160 Weiz (Austria), Fax: 0043-316-876-2710, Telephone: 0043-316-876-2721
    • Institute of Nanostructured Materials and Photonics, Joanneum Research GmbH, Franz-Pichlerstrasse 30, A-8160 Weiz (Austria), Fax: 0043-316-876-2710, Telephone: 0043-316-876-2721.
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Abstract

A nanoimprinting process that enables fabrication of self-aligned p- and n-type organic thin film transistors with small channel lengths is presented. Nanoimprint lithography with back-side exposure permit precise definition of the channel length down to the submicrometer regime and a diminutive gate to source/drain overlap. The self-aligned manufacturing process enables transistor setups with minimized electrode overlaps resulting in distinct decrease of parasitic capacitances and considerable increase in transition frequency. Fully functional small channel OTFTs with p- and n-type semiconductors are fabricated on glass as well as on flexible substrates with transition frequencies up to 400 kHz.

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