SEARCH

SEARCH BY CITATION

Keywords:

  • atomic layer deposition;
  • block copolymers;
  • metal-oxide;
  • patterning;
  • selective reaction
Thumbnail image of graphical abstract

Selective self-limited interaction of metal precursors with self-assembled block copolymer substrates, combined with the unique molecular-level management of reactions enabled by the atomic layer deposition process, is presented as a promising controllable way to synthesize patterned nanomaterials (e.g., Al2O3 see Figure, TiO2, etc.) with uniform and tunable dimensions.