Communication

Nanoscopic Patterned Materials with Tunable Dimensions via Atomic Layer Deposition on Block Copolymers

  1. Qing Peng1,
  2. Yu-Chih Tseng2,
  3. Seth B. Darling2,*,
  4. Jeffrey W. Elam1,*

Article first published online: 8 SEP 2010

DOI: 10.1002/adma.201002465

Issue

Advanced Materials

Advanced Materials

Volume 22, Issue 45, pages 5129–5133, December 1, 2010

Additional Information

How to Cite

Peng, Q., Tseng, Y.-C., Darling, S. B. and Elam, J. W. (2010), Nanoscopic Patterned Materials with Tunable Dimensions via Atomic Layer Deposition on Block Copolymers. Adv. Mater., 22: 5129–5133. doi: 10.1002/adma.201002465

Author Information

  1. 1

    Energy Systems Division, Argonne National Laboratory, Argonne, IL, 60439 (USA)

  2. 2

    Center for Nanoscale Materials, Argonne National Laboratory, Argonne, IL, 60439 (USA)

*Energy Systems Division, Argonne National Laboratory, Argonne, IL, 60439 (USA).

Publication History

  1. Issue published online: 30 NOV 2010
  2. Article first published online: 8 SEP 2010
  3. Manuscript Received: 8 JUL 2010

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Keywords:

  • atomic layer deposition;
  • block copolymers;
  • metal-oxide;
  • patterning;
  • selective reaction
Thumbnail image of graphical abstract

Selective self-limited interaction of metal precursors with self-assembled block copolymer substrates, combined with the unique molecular-level management of reactions enabled by the atomic layer deposition process, is presented as a promising controllable way to synthesize patterned nanomaterials (e.g., Al2O3 see Figure, TiO2, etc.) with uniform and tunable dimensions.

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