SEARCH

SEARCH BY CITATION

Cited in:

CrossRef

This article has been cited by:

  1. 1
    Hyoung-Seok Moon, Ju Young Kim, Hyeong Min Jin, Woo Jae Lee, Hyeon Jin Choi, Jeong Ho Mun, Young Joo Choi, Seung Keun Cha, Se Hun Kwon, Sang Ouk Kim, Atomic Layer Deposition Assisted Pattern Multiplication of Block Copolymer Lithography for 5 nm Scale Nanopatterning, Advanced Functional Materials, 2014, 24, 27
  2. 2
    Richard P. Padbury, Jesse S. Jur, Effect of Polymer Microstructure on the Nucleation Behavior of Alumina via Atomic Layer Deposition, The Journal of Physical Chemistry C, 2014, 118, 32, 18805

    CrossRef

  3. 3
    Tandra Ghoshal, Ramsankar Senthamaraikannan, Matthew T. Shaw, Justin D. Holmes, Michael A. Morris, Fabrication of Ordered, Large Scale, Horizontally-Aligned Si Nanowire Arrays Based on an In Situ Hard Mask Block Copolymer Approach, Advanced Materials, 2014, 26, 8
  4. 4
    Je Gwon Lee, Yeon Sik Jung, Sung-Hwan Han, Kwan-Mook Kim, Yang-Kyoo Han, Long-Range Ordered Self-Assembly of Novel Acrylamide-Based Diblock Copolymers for Nanolithography and Metallic Nanostructure Fabrication, Advanced Materials, 2014, 26, 18
  5. 5
    So Youn Kim, Jessica Gwyther, Ian Manners, Paul M. Chaikin, Richard A. Register, Metal-Containing Block Copolymer Thin Films Yield Wire Grid Polarizers with High Aspect Ratio, Advanced Materials, 2014, 26, 5
  6. 6
    Michele Perego, Federico Ferrarese Lupi, Monica Ceresoli, Tommaso Jacopo Giammaria, Gabriele Seguini, Emanuele Enrico, Luca Boarino, Diego Antonioli, Valentina Gianotti, Katia Sparnacci, Michele Laus, Ordering dynamics in symmetric PS-b-PMMA diblock copolymer thin films during rapid thermal processing, Journal of Materials Chemistry C, 2014, 2, 32, 6655

    CrossRef

  7. 7
    Antonio Checco, Atikur Rahman, Charles T. Black, Robust Superhydrophobicity in Large-Area Nanostructured Surfaces Defined by Block-Copolymer Self Assembly, Advanced Materials, 2014, 26, 6
  8. 8
    Gabriele Seguini, Tommaso J Giammaria, Federico Ferrarese Lupi, Katia Sparnacci, Diego Antonioli, Valentina Gianotti, Francesco Vita, Immacolata F Placentino, Jan Hilhorst, Claudio Ferrero, Oriano Francescangeli, Michele Laus, Michele Perego, Thermally induced self-assembly of cylindrical nanodomains in low molecular weight PS-b-PMMA thin films, Nanotechnology, 2014, 25, 4, 045301

    CrossRef

  9. 9
    Caroline A. Ross, Karl K. Berggren, Joy Y. Cheng, Yeon Sik Jung, Jae-Byum Chang, Three-Dimensional Nanofabrication by Block Copolymer Self-Assembly, Advanced Materials, 2014, 26, 25
  10. 10
    Jovan Kamcev, David S. Germack, Dmytro Nykypanchuk, Robert B. Grubbs, Chang-Yong Nam, Charles T. Black, Chemically Enhancing Block Copolymers for Block-Selective Synthesis of Self-Assembled Metal Oxide Nanostructures, ACS Nano, 2013, 7, 1, 339

    CrossRef

  11. 11
    Ville Miikkulainen, Markku Leskelä, Mikko Ritala, Riikka L. Puurunen, Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends, Journal of Applied Physics, 2013, 113, 2, 021301

    CrossRef

  12. 12
    Rhys Alun Griffiths, Aled Williams, Chloe Oakland, Jonathan Roberts, Aravind Vijayaraghavan, Thomas Thomson, Directed self-assembly of block copolymers for use in bit patterned media fabrication, Journal of Physics D: Applied Physics, 2013, 46, 50, 503001

    CrossRef

  13. 13
    Muruganathan Ramanathan, Yu-Chih Tseng, Katsuhiko Ariga, Seth B. Darling, Emerging trends in metal-containing block copolymers: synthesis, self-assembly, and nanomanufacturing applications, Journal of Materials Chemistry C, 2013, 1, 11, 2080

    CrossRef

  14. 14
    Xinhui Lu, Kevin G. Yager, Danvers Johnston, Charles T. Black, Benjamin M. Ocko, Grazing-incidence transmission X-ray scattering: surface scattering in the Born approximation, Journal of Applied Crystallography, 2013, 46, 1
  15. 15
    Jun Yin, Qiang Xu, Zhaogen Wang, Xueping Yao, Yong Wang, Highly ordered TiO2 nanostructures by sequential vapour infiltration of block copolymer micellar films in an atomic layer deposition reactor, Journal of Materials Chemistry C, 2013, 1, 5, 1029

    CrossRef

  16. 16
    Gregory N. Parsons, Jeffrey W. Elam, Steven M. George, Suvi Haukka, Hyeongtag Jeon, W. M. M. (Erwin) Kessels, Markku Leskelä, Paul Poodt, Mikko Ritala, Steven M. Rossnagel, History of atomic layer deposition and its relationship with the American Vacuum Society, Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2013, 31, 5, 050818

    CrossRef

  17. 17
    Vignesh Suresh, Meiyu Stella Huang, M.P. Srinivasan, Sivashankar Krishnamoorthy, In Situ Synthesis of High Density sub-50 nm ZnO Nanopatterned Arrays Using Diblock Copolymer Templates, ACS Applied Materials & Interfaces, 2013, 5, 12, 5727

    CrossRef

  18. 18
    Yujie Sun, Richard P. Padbury, Halil I. Akyildiz, Matthew P. Goertz, Jeremy A. Palmer, Jesse S. Jur, Influence of Subsurface Hybrid Material Growth on the Mechanical Properties of Atomic Layer Deposited Thin Films on Polymers, Chemical Vapor Deposition, 2013, 19, 4-6
  19. 19
    Gregory N. Parsons, Sarah E. Atanasov, Erinn C. Dandley, Christina K. Devine, Bo Gong, Jesse S. Jur, Kyoungmi Lee, Christopher J. Oldham, Qing Peng, Joseph C. Spagnola, Philip S. Williams, Mechanisms and reactions during atomic layer deposition on polymers, Coordination Chemistry Reviews, 2013, 257, 23-24, 3323

    CrossRef

  20. 20
    Muruganathan Ramanathan, Seth B. Darling, Nanofabrication with metallopolymers - recent developments and future perspectives, Polymer International, 2013, 62, 8
  21. 21
    X. Gu, I. Gunkel, T. P. Russell, Pattern transfer using block copolymers, Philosophical Transactions of the Royal Society A: Mathematical, Physical and Engineering Sciences, 2013, 371, 2000, 20120306

    CrossRef

  22. 22
    L. Oria, A. Ruiz de Luzuriaga, J.A. Alduncin, F. Perez-Murano, Polystyrene as a brush layer for directed self-assembly of block co-polymers, Microelectronic Engineering, 2013, 110, 234

    CrossRef

  23. 23
    Jie Yang, Ling Tong, Yang Yang, Xiaoqiang Chen, Jun Huang, Rizhi Chen, Yong Wang, Selective-swelling-induced porous block copolymers and their robust TiO2 replicas via atomic layer deposition for antireflective applications, Journal of Materials Chemistry C, 2013, 1, 33, 5133

    CrossRef

  24. 24
    Hyung Ju Ryu, Qianqian Tong, S. J. Sibener, Time-Resolved Analysis of Domain Growth and Alignment of Cylinder-Forming Block Copolymers Confined within Nanopatterned Substrates, The Journal of Physical Chemistry Letters, 2013, 4, 17, 2890

    CrossRef

  25. 25
    Tandra Ghoshal, Matthew T. Shaw, Ciara T. Bolger, Justin D. Holmes, Michael A. Morris, A general method for controlled nanopatterning of oxide dots: a microphase separated block copolymer platform, Journal of Materials Chemistry, 2012, 22, 24, 12083

    CrossRef

  26. 26
    Catherine Marichy, Mikhael Bechelany, Nicola Pinna, Atomic Layer Deposition of Nanostructured Materials for Energy and Environmental Applications, Advanced Materials, 2012, 24, 8
  27. 27
    Himadri Acharya, Jinwoo Sung, Insung Bae, TaeHee Kim, Dong Ha Kim, Cheolmin Park, Coassembly of Metal and Titanium Dioxide Nanocrystals Directed by Monolayered Block Copolymer Inverse Micelles for Enhanced Photocatalytic Performance, Chemistry - A European Journal, 2012, 18, 46
  28. 28
    Mato Knez, Diffusion phenomena in atomic layer deposition, Semiconductor Science and Technology, 2012, 27, 7, 074001

    CrossRef

  29. 29
    Bo Gong, Joseph C. Spagnola, Sara A. Arvidson, Saad A. Khan, Gregory N. Parsons, Directed inorganic modification of bi-component polymer fibers by selective vapor reaction and atomic layer deposition, Polymer, 2012, 53, 21, 4631

    CrossRef

  30. 30
    Gurpreet Singh, Kevin G. Yager, Brian Berry, Ho-Cheol Kim, Alamgir Karim, Dynamic Thermal Field-Induced Gradient Soft-Shear for Highly Oriented Block Copolymer Thin Films, ACS Nano, 2012, 6, 11, 10335

    CrossRef

  31. 31
    Yu-Chih Tseng, Anil U. Mane, Jeffrey W. Elam, Seth B. Darling, Enhanced Lithographic Imaging Layer Meets Semiconductor Manufacturing Specification a Decade Early, Advanced Materials, 2012, 24, 19
  32. 32
    Xiaodan Gu, Zuwei Liu, Ilja Gunkel, S. T. Chourou, Sung Woo Hong, Deirdre L. Olynick, Thomas P. Russell, High Aspect Ratio Sub-15 nm Silicon Trenches From Block Copolymer Templates, Advanced Materials, 2012, 24, 42
  33. 33
    Fengbin Li, Xueping Yao, Zhaogen Wang, Weihong Xing, Wanqin Jin, Jun Huang, Yong Wang, Highly Porous Metal Oxide Networks of Interconnected Nanotubes by Atomic Layer Deposition, Nano Letters, 2012, 12, 9, 5033

    CrossRef

  34. 34
    Ricardo Ruiz, Lei Wan, Jeffrey Lille, Kanaiyalal C. Patel, Elizabeth Dobisz, Danvers E. Johnston, Kim Kisslinger, Charles T. Black, Image quality and pattern transfer in directed self assembly with block-selective atomic layer deposition, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2012, 30, 6, 06F202

    CrossRef

  35. 35
    Muruganathan Ramanathan, S. Michael Kilbey, II, Qingmin Ji, Jonathan P. Hill, Katsuhiko Ariga, Materials self-assembly and fabrication in confined spaces, Journal of Materials Chemistry, 2012, 22, 21, 10389

    CrossRef

  36. 36
    Bo Gong, Do Han Kim, Gregory N. Parsons, Mesoporous Metal Oxides by Vapor Infiltration and Atomic Layer Deposition on Ordered Surfactant Polymer Films, Langmuir, 2012, 28, 32, 11906

    CrossRef

  37. 37
    David Pan, Qiang Fu, Jennifer Lu, Nanolithography through mixture of block copolymer micelles, Nanotechnology, 2012, 23, 30, 305302

    CrossRef

  38. 38
    Danvers E. Johnston, Plasma etch transfer of self-assembled polymer patterns, Journal of Micro/Nanolithography, MEMS, and MOEMS, 2012, 11, 3, 031306

    CrossRef

  39. 39
    Vignesh Suresh, Meiyu Stella Huang, M. P. Srinivasan, Cao Guan, Hong Jin Fan, Sivashankar Krishnamoorthy, Robust, High-Density Zinc Oxide Nanoarrays by Nanoimprint Lithography-Assisted Area-Selective Atomic Layer Deposition, The Journal of Physical Chemistry C, 2012, 116, 44, 23729

    CrossRef

  40. 40
    Jonathan E. Allen, Biswajit Ray, M. Ryyan Khan, Kevin G. Yager, Muhammad A. Alam, Charles T. Black, Self-assembly of single dielectric nanoparticle layers and integration in polymer-based solar cells, Applied Physics Letters, 2012, 101, 6, 063105

    CrossRef

  41. 41
    Woon Ik Park, Jong Moon Yoon, Moonkyu Park, Jinsup Lee, Sung Kyu Kim, Jae Won Jeong, Kyungho Kim, Hu Young Jeong, Seokwoo Jeon, Kwang Soo No, Jeong Yong Lee, Yeon Sik Jung, Self-Assembly-Induced Formation of High-Density Silicon Oxide Memristor Nanostructures on Graphene and Metal Electrodes, Nano Letters, 2012, 12, 3, 1235

    CrossRef

  42. 42
    Halil I. Akyildiz, Richard P. Padbury, Gregory N. Parsons, Jesse S. Jur, Temperature and Exposure Dependence of Hybrid Organic–Inorganic Layer Formation by Sequential Vapor Infiltration into Polymer Fibers, Langmuir, 2012, 28, 44, 15697

    CrossRef

  43. 43
    Qing Peng, Yu-Chih Tseng, Seth B. Darling, Jeffrey W. Elam, A Route to Nanoscopic MaterialsviaSequential Infiltration Synthesis on Block Copolymer Templates, ACS Nano, 2011, 5, 6, 4600

    CrossRef

  44. 44
    Yu-Chih Tseng, Qing Peng, Leonidas E. Ocola, Jeffrey W. Elam, Seth B. Darling, Enhanced Block Copolymer Lithography Using Sequential Infiltration Synthesis, The Journal of Physical Chemistry C, 2011, 115, 36, 17725

    CrossRef

  45. 45
    Yu-Chih Tseng, Qing Peng, Leonidas E. Ocola, David A. Czaplewski, Jeffrey W. Elam, Seth B. Darling, Enhanced polymeric lithography resists via sequential infiltration synthesis, Journal of Materials Chemistry, 2011, 21, 32, 11722

    CrossRef

  46. 46
    Yu-Chih Tseng, Qing Peng, Leonidas E. Ocola, David A. Czaplewski, Jeffrey W. Elam, Seth B. Darling, Etch properties of resists modified by sequential infiltration synthesis, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2011, 29, 6, 06FG01

    CrossRef

  47. 47
    Qin Lou, Pavan S. Chinthamanipeta, Devon A. Shipp, Mechanism of Titania Deposition into Cylindrical Poly(styrene-block-4 vinyl pyridine) Block Copolymer Templates, Langmuir, 2011, 27, 24, 15206

    CrossRef

  48. 48
    Fengbin Li, Ling Li, Xingzhi Liao, Yong Wang, Precise pore size tuning and surface modifications of polymeric membranes using the atomic layer deposition technique, Journal of Membrane Science, 2011, 385-386, 1

    CrossRef

  49. 49
    Gregory N. Parsons, Steven M. George, Mato Knez, Progress and future directions for atomic layer deposition and ALD-based chemistry, MRS Bulletin, 2011, 36, 11, 865

    CrossRef

  50. 50
    Bo Gong, Qing Peng, Jesse S. Jur, Christina K. Devine, Kyoungmi Lee, Gregory N. Parsons, Sequential Vapor Infiltration of Metal Oxides into Sacrificial Polyester Fibers: Shape Replication and Controlled Porosity of Microporous/Mesoporous Oxide Monoliths, Chemistry of Materials, 2011, 23, 15, 3476

    CrossRef

  51. 51
    A Andreozzi, L Lamagna, G Seguini, M Fanciulli, S Schamm-Chardon, C Castro, M Perego, The fabrication of tunable nanoporous oxide surfaces by block copolymer lithography and atomic layer deposition, Nanotechnology, 2011, 22, 33, 335303

    CrossRef

  52. 52
    Sivashankar Krishnamoorthy, Block Copolymer Nanopatterns as Enabling Platforms for Device Applications—Status, Issues, and Challenges,