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Nanoscopic Patterned Materials with Tunable Dimensions via Atomic Layer Deposition on Block Copolymers



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Selective self-limited interaction of metal precursors with self-assembled block copolymer substrates, combined with the unique molecular-level management of reactions enabled by the atomic layer deposition process, is presented as a promising controllable way to synthesize patterned nanomaterials (e.g., Al2O3 see Figure, TiO2, etc.) with uniform and tunable dimensions.