A highly efficient evaporative lithography method for wafer-scale patterning of microwire networks is introduced. The method is based on the use of a photolithography defined photoresist as the template for the evaporative self-assembly of nanoparticles contained in liquid suspensions. An example application is given showing the patterning of conducting-transparent microwire coating composed of gold nanoparticles that outperform standard ITO coatings.
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