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Advanced Materials

Sub-15nm Optical Fiber Nanoimprint Lithography: A Parallel, Self-aligned and Portable Approach

Authors

  • Gorgi Kostovski,

    Corresponding author
    1. Platform Technologies Research Institute, Microplatforms Research Group, School of Electrical and Computer Engineering, RMIT University, Melbourne, Victoria 3001, Australia
    • Platform Technologies Research Institute, Microplatforms Research Group, School of Electrical and Computer Engineering, RMIT University, Melbourne, Victoria 3001, Australia.
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  • Udayakumar Chinnasamy,

    1. Platform Technologies Research Institute, Microplatforms Research Group, School of Electrical and Computer Engineering, RMIT University, Melbourne, Victoria 3001, Australia
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  • Sasani Jayawardhana,

    1. Faculty of Engineering and Industrial Science, Swinburne University of Technology, Hawthorn, VIC 3122, Australia
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  • Paul R. Stoddart,

    1. Faculty of Engineering and Industrial Science, Swinburne University of Technology, Hawthorn, VIC 3122, Australia
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  • Arnan Mitchell

    1. Platform Technologies Research Institute, Microplatforms Research Group, School of Electrical and Computer Engineering, RMIT University, Melbourne, Victoria 3001, Australia
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Abstract

We demonstrate the parallel patterning of multiple optical-fiber facets using nanoimprint lithography on a novel platform. A resolution of better than 15 nm is demonstrated and up to 40 optical-fiber facets have been imprinted in parallel. The lithography platform features a self-alignment mechanism (see figure) that greatly relaxes the mechanical requirements, allowing for the demonstration of a compact, portable imprinting-module and the accommodation of non-planar, biological molds. The imprinted fibers are metalized and employed as bi-directional probes for surface-enhanced Raman scattering.

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