Get access

Extrinsic Corrugation-Assisted Mechanical Exfoliation of Monolayer Graphene

Authors


Abstract

original image

An extrinsic corrugation-assisted mechanical exfoliation process is introduced to fabricate ultra-large, patterned monolayer graphene on silicon substrates. This exfoliation method, without any contamination, offers not only an ideal alternative for the scalable deposition of monolayer graphene on silicon substrates, but also provides a promising basis for the construction of graphene-based integrated circuits.

Get access to the full text of this article

Ancillary