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Keywords:

  • block copolymer;
  • block copolymer lithography;
  • self-assembly;
  • templated self-assembly;
  • solvent annealing
Thumbnail image of graphical abstract

Poly(styrene-block-dimethylsiloxane) (PS-b-PDMS) block copolymers with a period as low as 13 nm have been self-assembled on a template formed from PS-b-PDMS of a 34–40 nm period, which is itself templated by micron-scale substrate features prepared using conventional lithography. This hierarchical process provides a simple method for directing the self-assembly of sub-10 nm features and registering them on the substrate.