Conformable Solid-Index Phase Masks Composed of High-Aspect-Ratio Micropillar Arrays and Their Application to 3D Nanopatterning

Authors

  • Junyong Park,

    1. Department of Materials Science and Engineering, KAIST Institute for Nanocentury, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305 – 701, Republic of Korea
    Search for more papers by this author
  • Jae Hong Park,

    1. Nano Fusion Technology Division, National Nanofab Center, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305 – 701, Republic of Korea
    Search for more papers by this author
  • Eunhye Kim,

    1. Department of Materials Science and Engineering, KAIST Institute for Nanocentury, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305 – 701, Republic of Korea
    Search for more papers by this author
  • Chi Won Ahn,

    1. Nano Fusion Technology Division, National Nanofab Center, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305 – 701, Republic of Korea
    Search for more papers by this author
  • Hyun Ik Jang,

    1. Nano Fusion Technology Division, National Nanofab Center, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305 – 701, Republic of Korea
    Search for more papers by this author
  • John A. Rogers,

    1. Departments of Materials Science and Engineering, Chemistry, Mechanical Science and Engineering, Electrical and Computer Engineering, Beckman Institute for Advanced Science and Technology, and Frederick Seitz Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801, USA
    Search for more papers by this author
  • Seokwoo Jeon

    Corresponding author
    1. Department of Materials Science and Engineering, KAIST Institute for Nanocentury, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305 – 701, Republic of Korea
    • Department of Materials Science and Engineering, KAIST Institute for Nanocentury, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305 – 701, Republic of Korea.
    Search for more papers by this author

Abstract

original image

Defect-free and dense micropillar arrays with a high aspect ratio are replicated from etched Si masters using high-modulus polyurethane acrylate. The newly designed conformable solid-index mask can generate high-resolution 3D nanostructures that can be patterned through proximity field nanopatterning (PnP) in a single exposure step. The superb optical property proves the quality of 3D nanostructures.

Ancillary