Get access
Advanced Materials

The Direct Writing of Plasmonic Gold Nanostructures by Electron-Beam-Induced Deposition

Authors

  • Katja Höflich,

    Corresponding author
    1. Max Planck Institute of Microstructure Physics, Weinberg 2, 06120 Halle, Germany
    2. Institute of Photonic Technology, Albert-Einstein-Strasse 9, 07745 Jena, Germany
    • Max Planck Institute of Microstructure Physics, Weinberg 2, 06120 Halle, Germany.
    Search for more papers by this author
  • Ren Bin Yang,

    1. Max Planck Institute of Microstructure Physics, Weinberg 2, 06120 Halle, Germany
    Search for more papers by this author
  • Andreas Berger,

    1. Max Planck Institute of Microstructure Physics, Weinberg 2, 06120 Halle, Germany
    2. Institute of Photonic Technology, Albert-Einstein-Strasse 9, 07745 Jena, Germany
    Search for more papers by this author
  • Gerd Leuchs,

    1. Max Planck Institute for the Science of Light, Günther-Scharowsky-Strasse 1, 91058 Erlangen, Germany
    2. University of Erlangen-Nuremberg, Staudtstrasse 7/B2, 91058 Erlangen, Germany
    Search for more papers by this author
  • Silke Christiansen

    1. Max Planck Institute for the Science of Light, Günther-Scharowsky-Strasse 1, 91058 Erlangen, Germany
    2. University of Erlangen-Nuremberg, Staudtstrasse 7/B2, 91058 Erlangen, Germany
    Search for more papers by this author

  • Dedicated to the memory of Ulrich Gösele

Abstract

Various nanostructures are directly written by electron-beam-induced deposition using dimethyl-gold(III)-acetylacetonate as the precursor gas. After purification, their potential applications include plasmonic devices and metamaterials. Carbon contamination of the as-written structures can be completely removed by low-temperature ozone treatment, leaving polycrystalline pure gold structures (see figure). This treatment reduces the size of the nanostructures but does not substantially alter their functional shape.

original image
Get access to the full text of this article

Ancillary