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Mechanophotopatterning on a Photoresponsive Elastomer

Authors

  • Christopher J. Kloxin,

    1. University of Colorado, Department of Chemical and Biological Engineering, 424 UCB, ECCH 111, 1111 Engineering Dr., Boulder, CO 80309–0424, USA
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  • Timothy F. Scott,

    1. University of Colorado, Department of Chemical and Biological Engineering, 424 UCB, ECCH 111, 1111 Engineering Dr., Boulder, CO 80309–0424, USA
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  • Hee Young Park,

    1. University of Colorado, Department of Chemical and Biological Engineering, 424 UCB, ECCH 111, 1111 Engineering Dr., Boulder, CO 80309–0424, USA
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  • Christopher N. Bowman

    Corresponding author
    1. University of Colorado, Department of Chemical and Biological Engineering, 424 UCB, ECCH 111, 1111 Engineering Dr., Boulder, CO 80309–0424, USA
    • University of Colorado, Department of Chemical and Biological Engineering, 424 UCB, ECCH 111, 1111 Engineering Dr., Boulder, CO 80309–0424, USA.
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Abstract

original image

Photopatterning of a photoreversible cova­lent elastomeric network under mechanical strain, or mechanophotopatterning, provides a facile approach to fabricate complex topographical features using elementary irradiation schemes. A photoresponsive material is deformed in two dimensions and irradiated through a mask, resulting in a transparent material with topography that reflects the concentric rings of the mask.

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