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Advanced Materials

Deterministic Nanotexturing by Directional Photofluidization Lithography

Authors

  • Seungwoo Lee,

    Corresponding author
    1. Department of Chemical and Biomolecular Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305–701, Korea
    • Department of Chemical and Biomolecular Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305–701, Korea.
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  • Jonghwa Shin,

    1. Department of Physics and Graduate School of Nanoscience and Technology, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305–701, Korea
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  • Hong Suk Kang,

    1. Graduate School of EEWS, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305–701, Korea
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  • Yong-Hee Lee,

    1. Department of Physics and Graduate School of Nanoscience and Technology, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305–701, Korea
    2. KAIST Institute for the Nanocentury, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305–701, Korea
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  • Jung-Ki Park

    Corresponding author
    1. Department of Chemical and Biomolecular Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305–701, Korea
    2. Graduate School of EEWS, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305–701, Korea
    3. KAIST Institute for the Nanocentury, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305–701, Korea
    • Department of Chemical and Biomolecular Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305–701, Korea.
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Abstract

Directional photofluidization lithography enables deterministic large-area nanotexturing of periodic surface reliefs with precisely controlled structural complexity. The proposed nanotexturing technique demonstrates a hidden potential of micro- and nanofabrication methods, which allows for manipulation of the photonic and interface properties of nanotextured surfaces.

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