Wafer-Scale Strain Engineering of Ultrathin Semiconductor Crystalline Layers
Version of Record online: 19 JUL 2011
Copyright © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Volume 23, Issue 33, pages 3801–3807, September 1, 2011
How to Cite
Leite, M. S., Warmann, E. C., Kimball, G. M., Burgos, S. P., Callahan, D. M. and Atwater, H. A. (2011), Wafer-Scale Strain Engineering of Ultrathin Semiconductor Crystalline Layers. Adv. Mater., 23: 3801–3807. doi: 10.1002/adma.201101309
- Issue online: 24 AUG 2011
- Version of Record online: 19 JUL 2011
- Manuscript Revised: 10 JUN 2011
- Manuscript Received: 7 APR 2011
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