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Advanced Materials

Continuous Patterning of Nanogratings by Nanochannel-Guided Lithography on Liquid Resists

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Abstract

A nanochannel-guided lithography technique is developed that achieves continuous fabrication of higher aspect-ratio nanograting structures by adopting a cross-linkable liquid resist coating. Under the guidance of nanochannels in the grating mold, the UV-curable liquid resist is smoothly extruded and self-stabilized along the slightly inscribed solid substrate, dictated by the resist wettability to the substrate as well as the substrate topography.

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