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A Versatile Nanopatterning Technique Based on Controlled Undercutting and Liftoff

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Abstract

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A new low-cost top-down nanolithography technique based on controlled undercutting and liftoff is reported. The method is applicable to a wide selection of inorganic materials (those that can be patterned by dry etching or lift-off) and can create 100-nm sized structures over wafer-sized areas. The method requires only conventional microfabrication processes and is ideal for producing nanowires, rings, and dots. A proof-of-concept experiment is also described for the fabrication of gold-nanowire transparent conducting electrodes, which show excellent optoelectronic properties.

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