Combinatorial Optimization of a Molecular Glass Photoresist System for Electron Beam Lithography
Version of Record online: 18 OCT 2011
Copyright © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Volume 23, Issue 45, pages 5404–5408, December 1, 2011
How to Cite
Bauer, W.-A. C., Neuber, C., Ober, C. K. and Schmidt, H.-W. (2011), Combinatorial Optimization of a Molecular Glass Photoresist System for Electron Beam Lithography. Adv. Mater., 23: 5404–5408. doi: 10.1002/adma.201103107
- Issue online: 29 NOV 2011
- Version of Record online: 18 OCT 2011
- Manuscript Revised: 19 SEP 2011
- Manuscript Received: 12 AUG 2011
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