Communication

Two-Photon Continuous Flow Lithography

  1. Simona C. Laza1,
  2. Marco Polo1,
  3. Antonio A. R. Neves1,
  4. Roberto Cingolani4,
  5. Andrea Camposeo1,2,
  6. Dario Pisignano1,2,3,*

Article first published online: 3 FEB 2012

DOI: 10.1002/adma.201103357

Issue

Advanced Materials

Advanced Materials

Volume 24, Issue 10, pages 1304–1308, March 8, 2012

Additional Information

How to Cite

Laza, S. C., Polo, M., Neves, A. A. R., Cingolani, R., Camposeo, A. and Pisignano, D. (2012), Two-Photon Continuous Flow Lithography. Adv. Mater., 24: 1304–1308. doi: 10.1002/adma.201103357

Author Information

  1. 1

    National Nanotechnology Laboratory of Istituto Nanoscienze-CNR, Università del Salento, via Arnesano, I-73100 Lecce, Italy

  2. 2

    Center for Biomolecular Nanotechnologies @ UNILE, Istituto Italiano di Tecnologia, via Barsanti, I-73010 Arnesano, Italy

  3. 3

    Dipartimento di Ingegneria dell'Innovazione, Università del Salento, via Arnesano I-73100 Lecce, Italy

  4. 4

    Italian Institute of Technology, via Morego 30, I-16163 Genova, Italy

*National Nanotechnology Laboratory of Istituto Nanoscienze-CNR, Università del Salento, via Arnesano, I-73100 Lecce, Italy.

Publication History

  1. Issue published online: 6 MAR 2012
  2. Article first published online: 3 FEB 2012
  3. Manuscript Received: 31 AUG 2011

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A new approach for microfluidics-based production of polymeric particles, namely two-photon continuous flow lithography, is reported. This technique takes advantage of two-photon lithography to create objects with sub-micrometer and 3D features, and overcomes the traditional process limitations of two-photon lithography by using multiple beam production under continuous flow. Polymeric fibers, helical and bow-tie particles with sub-diffraction resolution and surface roughness as low as 10 nm are demonstrated.

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