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Advanced Materials

Two-Photon Continuous Flow Lithography

Authors

  • Simona C. Laza,

    1. National Nanotechnology Laboratory of Istituto Nanoscienze-CNR, Università del Salento, via Arnesano, I-73100 Lecce, Italy
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  • Marco Polo,

    1. National Nanotechnology Laboratory of Istituto Nanoscienze-CNR, Università del Salento, via Arnesano, I-73100 Lecce, Italy
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  • Antonio A. R. Neves,

    1. National Nanotechnology Laboratory of Istituto Nanoscienze-CNR, Università del Salento, via Arnesano, I-73100 Lecce, Italy
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  • Roberto Cingolani,

    1. Italian Institute of Technology, via Morego 30, I-16163 Genova, Italy
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  • Andrea Camposeo,

    1. National Nanotechnology Laboratory of Istituto Nanoscienze-CNR, Università del Salento, via Arnesano, I-73100 Lecce, Italy
    2. Center for Biomolecular Nanotechnologies @ UNILE, Istituto Italiano di Tecnologia, via Barsanti, I-73010 Arnesano, Italy
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  • Dario Pisignano

    Corresponding author
    1. National Nanotechnology Laboratory of Istituto Nanoscienze-CNR, Università del Salento, via Arnesano, I-73100 Lecce, Italy
    2. Center for Biomolecular Nanotechnologies @ UNILE, Istituto Italiano di Tecnologia, via Barsanti, I-73010 Arnesano, Italy
    3. Dipartimento di Ingegneria dell'Innovazione, Università del Salento, via Arnesano I-73100 Lecce, Italy
    • National Nanotechnology Laboratory of Istituto Nanoscienze-CNR, Università del Salento, via Arnesano, I-73100 Lecce, Italy.
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Abstract

A new approach for microfluidics-based production of polymeric particles, namely two-photon continuous flow lithography, is reported. This technique takes advantage of two-photon lithography to create objects with sub-micrometer and 3D features, and overcomes the traditional process limitations of two-photon lithography by using multiple beam production under continuous flow. Polymeric fibers, helical and bow-tie particles with sub-diffraction resolution and surface roughness as low as 10 nm are demonstrated.

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