Communication: Advanced Optical Materials

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Large Area Fabrication of Leaning Silicon Nanopillars for Surface Enhanced Raman Spectroscopy

  1. Michael Stenbæk Schmidt1,*,
  2. Jörg Hübner2,
  3. Anja Boisen1

Article first published online: 22 NOV 2011

DOI: 10.1002/adma.201103496

Issue

Advanced Materials

Advanced Materials

Volume 24, Issue 10, pages OP11–OP18, March 8, 2012

Additional Information

How to Cite

Schmidt, M. S., Hübner, J. and Boisen, A. (2012), Large Area Fabrication of Leaning Silicon Nanopillars for Surface Enhanced Raman Spectroscopy. Adv. Mater., 24: OP11–OP18. doi: 10.1002/adma.201103496

Author Information

  1. 1

    DTU Nanotech, Technical University of Denmark, Department of Micro- and Nanotechnology, Ørsteds Plads, Building 345 east, 2800 Kgs. Lyngby, Phone: +45 45 25 58 46

  2. 2

    DTU Danchip, Technical University of Denmark, Department of Micro- and Nanotechnology, Ørsteds Plads, Building 345 east, 2800 Kgs. Lyngby, Phone: +45 45 25 58 46

*DTU Nanotech, Technical University of Denmark, Department of Micro- and Nanotechnology, Ørsteds Plads, Building 345 east, 2800 Kgs. Lyngby, Phone: +45 45 25 58 46.

Publication History

  1. Issue published online: 6 MAR 2012
  2. Article first published online: 22 NOV 2011
  3. Manuscript Revised: 12 OCT 2011
  4. Manuscript Received: 9 SEP 2011

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Keywords:

  • surface enhanced raman spectroscopy;
  • substrate fabrication;
  • maskless reactive ion etching;
  • leaning silicon nanopillars;
  • hot spots
Thumbnail image of graphical abstract

Using a simple two step fabrication process substrates with a large and uniform Raman enhancement, based on flexible free standing nanopillars can be manufactured over large areas using readily available silicon processing equipment.

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