Communication: Advanced Optical Materials

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Ultrafast Polymerization Inhibition by Stimulated Emission Depletion for Three-dimensional Nanolithography

  1. Joachim Fischer1,*,
  2. Martin Wegener2

Article first published online: 10 FEB 2012

DOI: 10.1002/adma.201103758

Issue

Advanced Materials

Advanced Materials

Volume 24, Issue 10, pages OP65–OP69, March 8, 2012

Additional Information

How to Cite

Fischer, J. and Wegener, M. (2012), Ultrafast Polymerization Inhibition by Stimulated Emission Depletion for Three-dimensional Nanolithography. Adv. Mater., 24: OP65–OP69. doi: 10.1002/adma.201103758

Author Information

  1. 1

    Institut für Angewandte Physik and DFG-Center for Functional Nanostructures (CFN), Karlsruhe Institute of Technology (KIT), Wolfgang-Gaede-Straße 1, D-76131 Karlsruhe, Germany

  2. 2

    Institut für Angewandte Physik and DFG-Center for Functional Nanostructures (CFN), Karlsruhe Institute of Technology (KIT), Wolfgang-Gaede-Straße 1, D-76131 Karlsruhe (Germany), and Institut für Nanotechnologie, Karlsruhe Institute of Technology (KIT), Hermann-von-Helmholtz-Platz 1, D-76344 Eggenstein-Leopoldshafen, Germany

*Institut für Angewandte Physik and DFG-Center for Functional Nanostructures (CFN), Karlsruhe Institute of Technology (KIT), Wolfgang-Gaede-Straße 1, D-76131 Karlsruhe, Germany.

Publication History

  1. Issue published online: 6 MAR 2012
  2. Article first published online: 10 FEB 2012
  3. Manuscript Revised: 14 DEC 2011
  4. Manuscript Received: 30 SEP 2011

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Keywords:

  • direct laser writing;
  • 3D lithography;
  • nanofabrication;
  • superresolution;
  • stimulated emission depletion
Thumbnail image of graphical abstract

To identify the depletion mechanism in the stimulated-emission-depletion (STED) inspired photoresist composed of a ketocoumarin photoinitiator in pentaerythritol tetraacrylate, we perform lithography with pulsed excitation and tunable delayed depletion. A fast component can unambiguously be assigned to stimulated emission. Our results allow the systematical optimization of the conditions in next-generation STED direct-laser-writing optical lithography.

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