Ultrafast Polymerization Inhibition by Stimulated Emission Depletion for Three-dimensional Nanolithography

Authors

  • Joachim Fischer,

    Corresponding author
    1. Institut für Angewandte Physik and DFG-Center for Functional Nanostructures (CFN), Karlsruhe Institute of Technology (KIT), Wolfgang-Gaede-Straße 1, D-76131 Karlsruhe, Germany
    • Institut für Angewandte Physik and DFG-Center for Functional Nanostructures (CFN), Karlsruhe Institute of Technology (KIT), Wolfgang-Gaede-Straße 1, D-76131 Karlsruhe, Germany.
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  • Martin Wegener

    1. Institut für Angewandte Physik and DFG-Center for Functional Nanostructures (CFN), Karlsruhe Institute of Technology (KIT), Wolfgang-Gaede-Straße 1, D-76131 Karlsruhe (Germany), and Institut für Nanotechnologie, Karlsruhe Institute of Technology (KIT), Hermann-von-Helmholtz-Platz 1, D-76344 Eggenstein-Leopoldshafen, Germany
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Abstract

original image

To identify the depletion mechanism in the stimulated-emission-depletion (STED) inspired photoresist composed of a ketocoumarin photoinitiator in pentaerythritol tetraacrylate, we perform lithography with pulsed excitation and tunable delayed depletion. A fast component can unambiguously be assigned to stimulated emission. Our results allow the systematical optimization of the conditions in next-generation STED direct-laser-writing optical lithography.

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