Chiral Nematic Fluids as Masks for Lithography
Version of Record online: 13 DEC 2011
Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Volume 24, Issue 3, pages 381–384, January 17, 2012
How to Cite
Jeong, H. S., Kim, Y. H., Lee, J. S., Kim, J. H., Srinivasarao, M. and Jung, H.-T. (2012), Chiral Nematic Fluids as Masks for Lithography. Adv. Mater., 24: 381–384. doi: 10.1002/adma.201103817
- Issue online: 10 JAN 2012
- Version of Record online: 13 DEC 2011
- Manuscript Received: 5 OCT 2011
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