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Advanced Materials

Atomic Layer Deposition of Nanostructured Materials for Energy and Environmental Applications

Authors

  • Catherine Marichy,

    1. Department of Chemistry, CICECO, University of Aveiro, 3810-193 Aveiro, Portugal
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  • Mikhael Bechelany,

    1. Institut Européen des Membranes (ENSCM, UMR CNRS 5635), Université Montpellier 2, Place Eugène Bataillon, 34095 Montpellier, France
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  • Nicola Pinna

    Corresponding author
    1. Department of Chemistry, CICECO, University of Aveiro, 3810-193 Aveiro, Portugal
    2. World Class University (WCU) program of Chemical, Convergence for Energy & Environment (C2E2), School of Chemical and Biological Engineering, College of Engineering, Seoul National University (SNU), Seoul 151-744, Korea
    • Department of Chemistry, CICECO, University of Aveiro, 3810-193 Aveiro, Portugal.

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Abstract

Atomic layer deposition (ALD) is a thin film technology that in the past two decades rapidly developed from a niche technology to an established method. It proved to be a key technology for the surface modification and the fabrication of complex nanostructured materials. In this Progress Report, after a short introduction to ALD and its chemistry, the versatility of the technique for the fabrication of novel functional materials will be discussed. Selected examples, focused on its use for the engineering of nanostructures targeting applications in energy conversion and storage, and on environmental issues, will be discussed. Finally, the challenges that ALD is now facing in terms of materials fabrication and processing will be also tackled.

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