Communication
Fabrication of Graphene Nanomesh by Using an Anodic Aluminum Oxide Membrane as a Template
Article first published online: 21 MAR 2012
DOI: 10.1002/adma.201104281
Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Issue

Advanced Materials
Special Issue: Materials Research at Nanyang Technological University, Singapore
Volume 24, Issue 30, pages 4138–4142, August 8, 2012
Additional Information
How to Cite
Zeng, Z., Huang, X., Yin, Z., Li, H., Chen, Y., Li, H., Zhang, Q., Ma, J., Boey, F. and Zhang, H. (2012), Fabrication of Graphene Nanomesh by Using an Anodic Aluminum Oxide Membrane as a Template. Adv. Mater., 24: 4138–4142. doi: 10.1002/adma.201104281
Publication History
- Issue published online: 2 AUG 2012
- Article first published online: 21 MAR 2012
- Manuscript Revised: 23 DEC 2011
- Manuscript Received: 8 NOV 2011
Keywords:
- graphene;
- nanomesh;
- nanofabrication;
- anodic aluminum oxide (AAO);
- field-effect transistors
Large-area graphene nanomesh (GNM) is prepared using a new and effective method, in which the O2 plasma treatment is used with an anodic aluminum oxide (AAO) membrane as an etch mask. By varying the pore size and cell wall thickness of the AAO membrane, GNM with tunable pore size and neck width can be prepared. As proof of concept, a field-effect transistor with 15 nm neck width GNM as the conductive channel is fabricated, which exhibits p-type semiconducting behavior.

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