Advanced Materials

Fabrication of Graphene Nanomesh by Using an Anodic Aluminum Oxide Membrane as a Template

Authors

  • Zhiyuan Zeng,

    1. School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore
    Search for more papers by this author
  • Xiao Huang,

    1. School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore
    Search for more papers by this author
  • Zongyou Yin,

    1. School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore
    Search for more papers by this author
  • Hong Li,

    1. Microelecronics Center, School of Electrical and Electronics Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore
    Search for more papers by this author
  • Yang Chen,

    1. School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore
    Search for more papers by this author
  • Hai Li,

    1. School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore
    Search for more papers by this author
  • Qing Zhang,

    1. Microelecronics Center, School of Electrical and Electronics Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore
    Search for more papers by this author
  • Jan Ma,

    1. School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore
    Search for more papers by this author
  • Freddy Boey,

    1. School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore
    Search for more papers by this author
  • Hua Zhang

    Corresponding author
    1. School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore
    • School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore.
    Search for more papers by this author

Abstract

Large-area graphene nanomesh (GNM) is prepared using a new and effective method, in which the O2 plasma treatment is used with an anodic aluminum oxide (AAO) membrane as an etch mask. By varying the pore size and cell wall thickness of the AAO membrane, GNM with tunable pore size and neck width can be prepared. As proof of concept, a field-effect transistor with 15 nm neck width GNM as the conductive channel is fabricated, which exhibits p-type semiconducting behavior.

original image

Ancillary