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Keywords:

  • epitaxial heterostructures;
  • ferroelectrics;
  • hard mask;
  • dielectric materials;
  • PbZr0.2Ti0.8O3
Thumbnail image of graphical abstract

Illustration of a new high-temperature hard-mask process based on traditional lithography and selective wet-etching of MgO. The hard mask is compatible with standard nano-lithography techniques and heat treatments in excess of 1000 °C. Here, this technique is applied to produce temperature-stable contacts that give rise to low leakage, improved fatigue properties, and excellent high-temperature stability in ferroelectric thin-film capacitors.