Get access

Enhancement in the Performance of Ultrathin Hematite Photoanode for Water Splitting by an Oxide Underlayer

Authors

  • Takashi Hisatomi,

    1. Institut des Sciences et Ingénierie Chimiques, Ecole Polytechnique Fédérale de Lausanne, CH-1015 Lausanne, Switzerland
    Search for more papers by this author
  • Hen Dotan,

    1. Institut des Sciences et Ingénierie Chimiques, Ecole Polytechnique Fédérale de Lausanne, CH-1015 Lausanne, Switzerland
    2. Faculty of Materials Engineering, Technion, Israel Institute of Technology, Haifa 32000, Israel
    Search for more papers by this author
  • Morgan Stefik,

    1. Institut des Sciences et Ingénierie Chimiques, Ecole Polytechnique Fédérale de Lausanne, CH-1015 Lausanne, Switzerland
    Search for more papers by this author
  • Kevin Sivula,

    1. Institut des Sciences et Ingénierie Chimiques, Ecole Polytechnique Fédérale de Lausanne, CH-1015 Lausanne, Switzerland
    Search for more papers by this author
  • Avner Rothschild,

    1. Faculty of Materials Engineering, Technion, Israel Institute of Technology, Haifa 32000, Israel
    Search for more papers by this author
  • Michaël Grätzel,

    Corresponding author
    1. Institut des Sciences et Ingénierie Chimiques, Ecole Polytechnique Fédérale de Lausanne, CH-1015 Lausanne, Switzerland
    • Institut des Sciences et Ingénierie Chimiques, Ecole Polytechnique Fédérale de Lausanne, CH-1015 Lausanne, Switzerland.
    Search for more papers by this author
  • Nripan Mathews

    Corresponding author
    1. Institut des Sciences et Ingénierie Chimiques, Ecole Polytechnique Fédérale de Lausanne, CH-1015 Lausanne, Switzerland
    2. School of Materials Science and Engineering, Nanyang Technological University, Singapore 639798, Singapore, Energy Research Institute @NTU (ERI@N), Nanyang Technological University, Singapore 637553, Singapore
    • Institut des Sciences et Ingénierie Chimiques, Ecole Polytechnique Fédérale de Lausanne, CH-1015 Lausanne, Switzerland.
    Search for more papers by this author

Abstract

original image

A 2-nm thick Nb2O5 underlayer deposited by atomic layer deposition increases the charge separation efficiency and the photovoltage of ultrathin hematite films by suppressing electron back injection. Absorbed photon-to-current efficiencies (APCE) as high as 40%, which are one of the highest ever reported with hematite photoanodes, are obtained at 400 nm at +1.43 V vs. RHE.

Get access to the full text of this article

Ancillary