Enhanced Lithographic Imaging Layer Meets Semiconductor Manufacturing Specification a Decade Early
Article first published online: 10 APR 2012
Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Volume 24, Issue 19, pages 2608–2613, May 15, 2012
How to Cite
Tseng, Y.-C., Mane, A. U., Elam, J. W. and Darling, S. B. (2012), Enhanced Lithographic Imaging Layer Meets Semiconductor Manufacturing Specification a Decade Early. Adv. Mater., 24: 2608–2613. doi: 10.1002/adma.201104871
- Issue published online: 9 MAY 2012
- Article first published online: 10 APR 2012
- Manuscript Received: 21 DEC 2012
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