Advanced Materials

Rectangular Symmetry Morphologies in a Topographically Templated Block Copolymer

Authors

  • Amir Tavakkoli K. G.,

    1. Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Cambridge, MA 02139, USA
    2. NUS Graduate School for Integrative Sciences & Engineering (NGS), Singapore 117456
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  • Adam F. Hannon,

    1. Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139, USA
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  • Kevin W. Gotrik,

    1. Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139, USA
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  • Alfredo Alexander-Katz,

    1. Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139, USA
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  • Caroline A. Ross,

    Corresponding author
    1. Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139, USA
    • Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139, USA.
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  • Karl K. Berggren

    Corresponding author
    1. Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Cambridge, MA 02139, USA
    2. Kavli Institute of Nanoscience, Technical University of Delft, Delft, The Netherlands
    • Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Cambridge, MA 02139, USA
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Abstract

Using an array of majority-block-functionalized posts makes it possible to locally control the self-assembly of a block copolymer and achieve several morphologies on a single substrate. A template consisting of a square symmetry array of posts produces a square-symmetry lattice of microdomains, which doubles the areal density of features.

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