Communication

Two-Dimensional Polymer as a Mask for Surface Nanopatterning

  1. Sylvain Clair1,2,*,
  2. Oualid Ourdjini1,2,
  3. Mathieu Abel1,2,*,
  4. Louis Porte1,2

Article first published online: 1 FEB 2012

DOI: 10.1002/adma.201200063

Issue

Advanced Materials

Advanced Materials

Volume 24, Issue 9, pages 1252–1254, March 2, 2012

Additional Information

How to Cite

Clair, S., Ourdjini, O., Abel, M. and Porte, L. (2012), Two-Dimensional Polymer as a Mask for Surface Nanopatterning. Adv. Mater., 24: 1252–1254. doi: 10.1002/adma.201200063

Author Information

  1. 1

    Aix-Marseille Univ, IM2NP, Campus de Saint-Jérôme, Case 142, F-13397 Marseille Cedex 20, France

  2. 2

    CNRS, IM2NP UMR 6242, Campus de Saint-Jérôme, Case 142, F-13397 Marseille Cedex 20, France

*Aix-Marseille Univ, IM2NP, Campus de Saint-Jérôme, Case 142, F-13397 Marseille Cedex 20, France.

Publication History

  1. Issue published online: 24 FEB 2012
  2. Article first published online: 1 FEB 2012
  3. Manuscript Received: 5 JAN 2012

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NaCl islands are used as a sacrificial layer to selectively deposit a boronic acid based two-dimensional polymer. The nanostructured polymer layer can be used as a negative mask to create Fe islands in a nanolithography mimicking process.

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