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Two-Dimensional Polymer as a Mask for Surface Nanopatterning

Authors

  • Sylvain Clair,

    Corresponding author
    1. Aix-Marseille Univ, IM2NP, Campus de Saint-Jérôme, Case 142, F-13397 Marseille Cedex 20, France
    2. CNRS, IM2NP UMR 6242, Campus de Saint-Jérôme, Case 142, F-13397 Marseille Cedex 20, France
    • Aix-Marseille Univ, IM2NP, Campus de Saint-Jérôme, Case 142, F-13397 Marseille Cedex 20, France.
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  • Oualid Ourdjini,

    1. Aix-Marseille Univ, IM2NP, Campus de Saint-Jérôme, Case 142, F-13397 Marseille Cedex 20, France
    2. CNRS, IM2NP UMR 6242, Campus de Saint-Jérôme, Case 142, F-13397 Marseille Cedex 20, France
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  • Mathieu Abel,

    Corresponding author
    1. Aix-Marseille Univ, IM2NP, Campus de Saint-Jérôme, Case 142, F-13397 Marseille Cedex 20, France
    2. CNRS, IM2NP UMR 6242, Campus de Saint-Jérôme, Case 142, F-13397 Marseille Cedex 20, France
    • Aix-Marseille Univ, IM2NP, Campus de Saint-Jérôme, Case 142, F-13397 Marseille Cedex 20, France.
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  • Louis Porte

    1. Aix-Marseille Univ, IM2NP, Campus de Saint-Jérôme, Case 142, F-13397 Marseille Cedex 20, France
    2. CNRS, IM2NP UMR 6242, Campus de Saint-Jérôme, Case 142, F-13397 Marseille Cedex 20, France
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Abstract

original image

NaCl islands are used as a sacrificial layer to selectively deposit a boronic acid based two-dimensional polymer. The nanostructured polymer layer can be used as a negative mask to create Fe islands in a nanolithography mimicking process.

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