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Advanced Materials

Nanotransfer Printing with sub-10 nm Resolution Realized using Directed Self-Assembly

Authors

  • Jae Won Jeong,

    1. Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 305-701, Republic of Korea
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  • Woon Ik Park,

    1. Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 305-701, Republic of Korea
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  • Lee-Mi Do,

    1. RFID/USN Research Department, Electronics and Telecommunications Research Institute (ETRI), 218 Gajeong-dong Yuseong-gu, Daejeon 305-700, Republic of Korea
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  • Jong-Hyun Park,

    1. Material R&D Department, LG Display Co., Ltd., 1007, Deogeon-ri,Wollong-myeon, Paju-si, Gyeonggi-do, 413-811, Republic of Korea
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  • Tae-Heon Kim,

    1. Material R&D Department, LG Display Co., Ltd., 1007, Deogeon-ri,Wollong-myeon, Paju-si, Gyeonggi-do, 413-811, Republic of Korea
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  • Geesung Chae,

    1. Material R&D Department, LG Display Co., Ltd., 1007, Deogeon-ri,Wollong-myeon, Paju-si, Gyeonggi-do, 413-811, Republic of Korea
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  • Yeon Sik Jung

    Corresponding author
    1. Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 305-701, Republic of Korea
    • Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 305-701, Republic of Korea.
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Abstract

An extraordinarily facile sub-10 nm fabrication method using the synergic combination of nanotransfer printing and the directed self-assembly of block copolymers is introduced. The approach is realized by achieving the uniform self-assembly of polydimethylsiloxane (PDMS)-containing block copolymers on a PDMS mold through the stabilization of the block copolymer thin films. This simple printing method can be applied on oxides, metals, polymers, and non-planar substrates without pretreatments. The fabrication of well-aligned metallic and polymeric functional nanostructures and crossed wire structures is also presented.

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