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Patterning Techniques for Metal Organic Frameworks

Authors

  • Paolo Falcaro,

    Corresponding author
    1. CSIRO, Division of Materials Science and Engineering, Private Bag 33, Clayton South MDC, Victoria 3169, Australia
    • CSIRO, Division of Materials Science and Engineering, Private Bag 33, Clayton South MDC, Victoria 3169, Australia.
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  • Dario Buso,

    1. CSIRO, Division of Materials Science and Engineering, Private Bag 33, Clayton South MDC, Victoria 3169, Australia
    2. Centre for Micro - Photonics and CUDOS, Faculty of Engineering and Industrial Sciences - Swinburne University of Technology - Hawthorn, Victoria 3122, Australia
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  • Anita J. Hill,

    1. CSIRO, Division of Materials Science and Engineering, Private Bag 33, Clayton South MDC, Victoria 3169, Australia
    2. CSIRO, Division of Process Science and Engineering, Private Bag 33, Clayton South MDC, Victoria 3169, Australia
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  • Cara M. Doherty

    Corresponding author
    1. CSIRO, Division of Materials Science and Engineering, Private Bag 33, Clayton South MDC, Victoria 3169, Australia
    • CSIRO, Division of Materials Science and Engineering, Private Bag 33, Clayton South MDC, Victoria 3169, Australia.
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Abstract

The tuneable pore size and architecture, chemical properties and functionalization make metal organic frameworks (MOFs) attractive versatile stimuli-responsive materials. In this context, MOFs hold promise for industrial applications and a fervent research field is currently investigating MOF properties for device fabrication. Although the material properties have a crucial role, the ability to precisely locate the functional material is fundamental for device fabrication. In this progress report, advancements in the control of MOF positioning and precise localization of functional materials within MOF crystals are presented. Advantages and limitations of each reviewed technique are critically investigated, and several important gaps in the technological development for device fabrication are highlighted. Finally, promising patterning techniques are presented which are inspired by previous studies in organic and inorganic crystal patterning for the future of MOF lithography.

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