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Advanced Materials

Single-Crystalline Silver Films for Plasmonics

Authors

  • Jong Hyuk Park,

    1. Optical Materials Engineering Laboratory, ETH Zurich, 8092 Zurich, Switzerland
    2. Department of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, MN 55455, USA
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  • Palak Ambwani,

    1. Department of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, MN 55455, USA
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  • Michael Manno,

    1. Department of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, MN 55455, USA
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  • Nathan C. Lindquist,

    1. Department of Electrical and Computer Engineering, University of Minnesota, Minneapolis, MN 55455, USA
    Current affiliation:
    1. Dr. N. C. Lindquist, Physics Department, Bethel University, Saint Paul, MN 55112, USA
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  • Prashant Nagpal,

    1. Department of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, MN 55455, USA
    Current affiliation:
    1. Dr. P. Nagpal, Los Alamos National Laboratory, Los Alamos, NM 87545, USA
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  • Sang-Hyun Oh,

    1. Department of Electrical and Computer Engineering, University of Minnesota, Minneapolis, MN 55455, USA
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  • Chris Leighton,

    1. Department of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, MN 55455, USA
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  • David J. Norris

    Corresponding author
    1. Optical Materials Engineering Laboratory, ETH Zurich, 8092 Zurich, Switzerland
    • Optical Materials Engineering Laboratory, ETH Zurich, 8092 Zurich, Switzerland.
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Abstract

A simple route to flat, large-area, single-crystalline films for plasmonics is demonstrated by sputter deposition of silver onto mica substrates at elevated temperatures. The films exhibit improved dielectric properties and allow more precise patterning of high-quality nanostructures for plasmonic applications.

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