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Tailored Star Block Copolymer Architecture for High Performance Chemically Amplified Resists

Authors

  • Florian Wieberger,

    1. Makromolekulare Chemie I, Bayreuther Institut für Makromolekülforschung (BIMF) and Bayreuther Zentrum für Kolloide und Grenzflächen (BZKG), Universität Bayreuth, 95440 Bayreuth, Germany
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  • Christian Neuber,

    1. Makromolekulare Chemie I, Bayreuther Institut für Makromolekülforschung (BIMF) and Bayreuther Zentrum für Kolloide und Grenzflächen (BZKG), Universität Bayreuth, 95440 Bayreuth, Germany
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  • Christopher K. Ober,

    1. Department of Materials Science and Engineering, Cornell University, Ithaca, NY 14853, USA
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  • Hans-Werner Schmidt

    Corresponding author
    1. Makromolekulare Chemie I, Bayreuther Institut für Makromolekülforschung (BIMF) and Bayreuther Zentrum für Kolloide und Grenzflächen (BZKG), Universität Bayreuth, 95440 Bayreuth, Germany
    • Makromolekulare Chemie I, Bayreuther Institut für Makromolekülforschung (BIMF) and Bayreuther Zentrum für Kolloide und Grenzflächen (BZKG), Universität Bayreuth, 95440 Bayreuth, Germany.
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Abstract

Star block copolymers are demonstrated for their application as a high-performance resist material. This new resist material shows advanced progress in sensitivity and solubility contrast and is finally combinatorially optimized to achieve a 66 nm line/space pattern. The tailored molecular architecture of the star block copolymer is synthesized via core-first atom transfer radical polymerization (ATRP) and shows narrow polydispersity indices below 1.2.

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