High Aspect Ratio Sub-15 nm Silicon Trenches From Block Copolymer Templates
Version of Record online: 20 AUG 2012
Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Volume 24, Issue 42, pages 5688–5694, November 8, 2012
How to Cite
Gu, X., Liu, Z., Gunkel, I., Chourou, S. T., Hong, S. W., Olynick, D. L. and Russell, T. P. (2012), High Aspect Ratio Sub-15 nm Silicon Trenches From Block Copolymer Templates. Adv. Mater., 24: 5688–5694. doi: 10.1002/adma.201202361
- Issue online: 2 NOV 2012
- Version of Record online: 20 AUG 2012
- Manuscript Revised: 6 JUL 2012
- Manuscript Received: 12 JUN 2012
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