Dry Lithography of Large-Area, Thin-Film Organic Semiconductors Using Frozen CO2 Resists
Version of Record online: 11 SEP 2012
Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Volume 24, Issue 46, pages 6136–6140, December 4, 2012
How to Cite
Bahlke, M. E., Mendoza, H. A., Ashall, D. T., Yin, A. S. and Baldo, M. A. (2012), Dry Lithography of Large-Area, Thin-Film Organic Semiconductors Using Frozen CO2 Resists. Adv. Mater., 24: 6136–6140. doi: 10.1002/adma.201202446
- Issue online: 29 NOV 2012
- Version of Record online: 11 SEP 2012
- Manuscript Revised: 1 AUG 2012
- Manuscript Received: 15 JUN 2012
- Funded Access
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