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Keywords:

  • SnO2;
  • ZrO2;
  • thin film transistors;
  • solution process;
  • sol–gel process;
  • transparent;
  • metal oxides
Thumbnail image of graphical abstract

This work employs novel SnO2 gel-like precursors in conjunction with sol–gel deposited ZrO2 gate dielectrics to realize high-performance transparent transistors. Representative devices show excellent performance and transparency, and deliver mobility of 103 cm2 V−1 s−1 in saturation at operation voltages as low as 2 V, a sub-threshold swing of only 0.3 V/decade, and Ion/Ioff of 104∼105.