We have overcome the cost and time consumption limitations of common lithography techniques used to control the self-assembly of block copolymers into highly ordered 2D arrays through the use of a guiding pattern created from a polymeric sub-layer. The guiding pattern is a sinusoidal surface-relief grating interferometrically inscribed onto an azobenzene containing copolymer sub-layer leading to a defect-free single grain of block copolymer domains.
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