Circular Dichroism from Chiral Nanomaterial Fabricated by On-Edge Lithography

Authors

  • Kay Dietrich,

    Corresponding author
    1. Institute of Applied Physics, Abbe Center of Photonics, Friedrich-Schiller-Universität Jena, Max-Wien-Platz 1, 07743 Jena, Germany
    • Institute of Applied Physics, Abbe Center of Photonics, Friedrich-Schiller-Universität Jena, Max-Wien-Platz 1, 07743 Jena, Germany.
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  • Dennis Lehr,

    1. Institute of Applied Physics, Abbe Center of Photonics, Friedrich-Schiller-Universität Jena, Max-Wien-Platz 1, 07743 Jena, Germany
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  • Christian Helgert,

    1. Institute of Applied Physics, Abbe Center of Photonics, Friedrich-Schiller-Universität Jena, Max-Wien-Platz 1, 07743 Jena, Germany
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  • Andreas Tünnermann,

    1. Institute of Applied Physics, Abbe Center of Photonics, Friedrich-Schiller-Universität Jena, Max-Wien-Platz 1, 07743 Jena, Germany
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  • Ernst-Bernhard Kley

    1. Institute of Applied Physics, Abbe Center of Photonics, Friedrich-Schiller-Universität Jena, Max-Wien-Platz 1, 07743 Jena, Germany
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Abstract

original image

A novel-shaped plasmonic chiral nanomaterial exhibiting circular dichroism in the near-infrared spectral range is presented. Applying on-edge lithography, a large area with these nanostructures is efficiently covered. This fabrication method offers tunability of the operation bandwidth by tailoring the chiral shape.

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