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Communication

Hybrid High-Resolution Three-Dimensional Nanofabrication for Metamaterials and Nanoplasmonics

  1. Isabelle Staude1,*,
  2. Manuel Decker1,
  3. Michael J. Ventura2,
  4. Chennupati Jagadish3,
  5. Dragomir N. Neshev1,
  6. Min Gu2,
  7. Yuri S. Kivshar1

Article first published online: 26 NOV 2012

DOI: 10.1002/adma.201203564

Issue

Advanced Materials

Advanced Materials

Volume 25, Issue 9, pages 1260–1264, March 6, 2013

Additional Information

How to Cite

Staude, I., Decker, M., Ventura, M. J., Jagadish, C., Neshev, D. N., Gu, M. and Kivshar, Y. S. (2013), Hybrid High-Resolution Three-Dimensional Nanofabrication for Metamaterials and Nanoplasmonics. Adv. Mater., 25: 1260–1264. doi: 10.1002/adma.201203564

Author Information

  1. 1

    Nonlinear Physics Centre and Centre for Ultra-high bandwidth Devices for Optical Systems (CUDOS), Research School of Physics and Engineering, The Australian National University, Canberra ACT 0200, Australia

  2. 2

    Centre for Micro-Photonics and Centre for Ultra-high bandwidth Devices for Optical Systems (CUDOS), Faculty of Engineering and Industrial Sciences, Swinburne University of Technology, Hawthorn, Victoria, Australia

  3. 3

    Department of Electronic Materials Engineering, Research School of Physics and Engineering, The Australian National University, Canberra ACT 0200, Australia

*Nonlinear Physics Centre and Centre for Ultra-high bandwidth Devices for Optical Systems (CUDOS), Research School of Physics and Engineering, The Australian National University, Canberra ACT 0200, Australia.

Publication History

  1. Issue published online: 4 MAR 2013
  2. Article first published online: 26 NOV 2012
  3. Manuscript Revised: 24 OCT 2012
  4. Manuscript Received: 27 AUG 2012

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Keywords:

  • three-dimensional nanofabrication;
  • metamaterials;
  • nanoplasmonics;
  • nanoantennas;
  • direct laser writing
Thumbnail image of graphical abstract

We propose a novel hybrid fabrication approach that combines direct laser writing with a subsequent electron-beam lithography step. This approach allows realizing out-of-plane plasmonic nanostructures with truly nanoscopic feature sizes. The excellent quality of the obtained structures is evidenced by optical characterization of upright-standing split-ring resonator arrays fabricated along these lines.

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