Full Paper: Advanced Optical Materials
Resolution Limit in Plasmonic Lithography for Practical Applications beyond 2x-nm Half Pitch
Article first published online: 8 OCT 2012
Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Volume 24, Issue 44, pages OP337–OP344, November 20, 2012
How to Cite
Kim, S., Jung, H., Kim, Y., Jang, J. and Hahn, J. W. (2012), Resolution Limit in Plasmonic Lithography for Practical Applications beyond 2x-nm Half Pitch. Adv. Mater., 24: OP337–OP344. doi: 10.1002/adma.201203604
- Issue published online: 20 NOV 2012
- Article first published online: 8 OCT 2012
- Manuscript Revised: 22 AUG 2012
- Manuscript Received: 9 JUN 2012
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