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Advanced Materials

Surface Energy Engineered, High-Resolution Micropatterning of Solution-Processed Reduced Graphene Oxide Thin Films

Authors

  • Nam Hee Kim,

    1. School of Chemical Engineering and Materials Science, Chung-Ang University, 84 Heukseok-ro, Dongjak-gu, Seoul 156-756, Republic of Korea
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  • Beom Jun Kim,

    1. SKKU Advanced Institute of Nanotechnology (SAINT), Department of Chemical Engineering, Sungkyunkwan University, Suwon 440-746, Republic of Korea
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  • Yeongun Ko,

    1. School of Chemical Engineering and Materials Science, Chung-Ang University, 84 Heukseok-ro, Dongjak-gu, Seoul 156-756, Republic of Korea
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  • Jeong Ho Cho,

    1. SKKU Advanced Institute of Nanotechnology (SAINT), Department of Chemical Engineering, Sungkyunkwan University, Suwon 440-746, Republic of Korea
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  • Suk Tai Chang

    Corresponding author
    1. School of Chemical Engineering and Materials Science, Chung-Ang University, 84 Heukseok-ro, Dongjak-gu, Seoul 156-756, Republic of Korea
    • School of Chemical Engineering and Materials Science, Chung-Ang University, 84 Heukseok-ro, Dongjak-gu, Seoul 156-756, Republic of Korea.
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Abstract

Fast and reproducible patterning of high-resolution rGO microstructures over a large area directly on various substrates by modulating the surface energy is reported. The pattern formation of rGO thin films is based on the difference in the adhesion strength between the mold/rGO and rGO/substrates interfaces. Such highly defined rGO micropatterns are applied as electrodes for high-performance flexible and transparent OFETs.

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