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  • Open Access

Polymerization Inhibition by Triplet State Absorption for Nanoscale Lithography

Authors

  • Benjamin Harke,

    Corresponding author
    1. Department of Nanophysics, Istituto Italiano di Tecnologia (IIT), Via Morego 30, 16163 Genova, Italy
    • Department of Nanophysics, Istituto Italiano di Tecnologia (IIT), Via Morego 30, 16163 Genova, Italy
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  • William Dallari,

    1. Department of Nanophysics, Istituto Italiano di Tecnologia (IIT), Via Morego 30, 16163 Genova, Italy
    2. Dipatimento di Fisica, Universita' degli Studi di Genova, via Dodecaneso 13, 16153, Genova, Italy
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  • Giulia Grancini,

    1. Center for Nano Science and Technology@PoliMi, Istituto Italiano di Tecnologia (IIT), Via Giovanni Pascoli 70/3, 20133 Milano, Italy
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  • Daniele Fazzi,

    1. Center for Nano Science and Technology@PoliMi, Istituto Italiano di Tecnologia (IIT), Via Giovanni Pascoli 70/3, 20133 Milano, Italy
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  • Fernando Brandi,

    1. Department of Nanophysics, Istituto Italiano di Tecnologia (IIT), Via Morego 30, 16163 Genova, Italy
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  • Annamaria Petrozza,

    Corresponding author
    1. Center for Nano Science and Technology@PoliMi, Istituto Italiano di Tecnologia (IIT), Via Giovanni Pascoli 70/3, 20133 Milano, Italy
    • Center for Nano Science and Technology@PoliMi, Istituto Italiano di Tecnologia (IIT), Via Giovanni Pascoli 70/3, 20133 Milano, Italy.
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  • Alberto Diaspro

    1. Department of Nanophysics, Istituto Italiano di Tecnologia (IIT), Via Morego 30, 16163 Genova, Italy
    2. Dipatimento di Fisica, Universita' degli Studi di Genova, via Dodecaneso 13, 16153, Genova, Italy
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Abstract

original image

The diffraction limit in direct-laser-writing (DLW) lithography can be circumvented by selective inhibition of the polymerization. By combining nanosecond transient absorption spectroscopy and density functional theory it is demonstrated that polymerization inhibition is possible by a direct absorption of the lowest triplet state. Polymerization inhibition by triplet state absorption (TSA) has the potential to bring DLW lithography into the nanometer scale.

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