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Transparent Conductive Gas-Permeation Barriers on Plastics by Atomic Layer Deposition



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A mixed-deposition atomic layer deposition process produces Hf:ZnO films with uniform dopant distribution and high electrical conductivity (resistivity = 4.5 × 10−4 W cm), optical transparency (>85% from 400–1800 nm), and moisture-barrier property (water vapor transmission rate = 6.3 × 10−6 g m−2 day−1).

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