Advanced Materials

Nanoimprint Lithography: A Polyferroplatinyne Precursor for the Rapid Fabrication of L10-FePt-type Bit Patterned Media by Nanoimprint Lithography (Adv. Mater. 8/2012)

Authors

  • Qingchen Dong,

    1. Institute of Molecular Functional Materials, Department of Chemistry and Institute of Advanced Materials, Hong Kong Baptist University, Waterloo Road, Hong Kong, P. R. China
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  • Guijun Li,

    1. Department of Electrical and Electronic Engineering, The University of Hong Kong, Pokfulam Road, Hong Kong, P. R. China
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  • Cheuk-Lam Ho,

    1. Institute of Molecular Functional Materials, Department of Chemistry and Institute of Advanced Materials, Hong Kong Baptist University, Waterloo Road, Hong Kong, P. R. China
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  • Mahtab Faisal,

    1. Department of Chemistry, The Hong Kong University of Science and Technology, Clearwater Bay, Hong Kong, P. R. China
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  • Chi-Wah Leung,

    1. Department of Applied Physics, Hong Kong Polytechnic University, Hung Hom, Hong Kong, P. R. China
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  • Philip Wing-Tat Pong,

    Corresponding author
    1. Department of Electrical and Electronic Engineering, The University of Hong Kong, Pokfulam Road, Hong Kong, P. R. China
    • Philip Wing-Tat Pong, Department of Electrical and Electronic Engineering, The University of Hong Kong, Pokfulam Road, Hong Kong, P. R. China

      Ian Manners, School of Chemistry, University of Bristol, Bristol, BS8 1TS, UK

      Wai-Yeung Wong, Institute of Molecular Functional Materials, Department of Chemistry and Institute of Advanced Materials, Hong Kong Baptist University, Waterloo Road, Hong Kong, P. R. China.

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  • Kun Liu,

    1. Department of Chemistry, University of Toronto, Toronto, M5S 3H6, Canada
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  • Ben-Zhong Tang,

    1. Department of Chemistry, The Hong Kong University of Science and Technology, Clearwater Bay, Hong Kong, P. R. China
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  • Ian Manners,

    Corresponding author
    1. School of Chemistry, University of Bristol, Bristol, BS8 1TS, UK
    • Philip Wing-Tat Pong, Department of Electrical and Electronic Engineering, The University of Hong Kong, Pokfulam Road, Hong Kong, P. R. China

      Ian Manners, School of Chemistry, University of Bristol, Bristol, BS8 1TS, UK

      Wai-Yeung Wong, Institute of Molecular Functional Materials, Department of Chemistry and Institute of Advanced Materials, Hong Kong Baptist University, Waterloo Road, Hong Kong, P. R. China.

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  • Wai-Yeung Wong

    Corresponding author
    1. Institute of Molecular Functional Materials, Department of Chemistry and Institute of Advanced Materials, Hong Kong Baptist University, Waterloo Road, Hong Kong, P. R. China
    • Philip Wing-Tat Pong, Department of Electrical and Electronic Engineering, The University of Hong Kong, Pokfulam Road, Hong Kong, P. R. China

      Ian Manners, School of Chemistry, University of Bristol, Bristol, BS8 1TS, UK

      Wai-Yeung Wong, Institute of Molecular Functional Materials, Department of Chemistry and Institute of Advanced Materials, Hong Kong Baptist University, Waterloo Road, Hong Kong, P. R. China.

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Abstract

On page 1034 W.-T. Pong, I. Manners, W.-Y. Wong, and co-workers report the simple and rapid fabrication of patterned L10-FePt alloy nanoparticles from a solution-processable bimetallic polyferroplatinyne polymer precursor. This approach holds great promise for fabricating L10-FePt-type bit-patterned media using high-throughput nanoimprint lithography, followed by controlled pyrolysis of the nanopatterned polymer. Each dot in the asgenerated FePt-containing nanodot array is magnetic, which can serve as a good platform for future ultrahigh-density perpen-dicular magnetic data recording systems.

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